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  • Etching & Cleaning Solutions
  • Single Spin processor SS series

  • Single Spin processor SS series
  • This system made a breakthrough in conventional clean process. Its outstanding
    performance boosts yield as well as reduces the total CoO. ZEUS/JET original technology offers a solution to problems of wet clean process.
    - Shortens process steps by protecting a wafer surface sith N2(inert gas)
    - Removing multi-layer films by single recipe
    - The chemical circulation system reduces chemical use as well as the CoO
    - Small footprint
  • E-Mail : [semi@globalzeus.com]
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  • Wet Station BW Series

  • Wet Station BW Series
  • Increased productivity!
    - Improved cleaning performance adoption of Flash Clean
    - Increased throughput
    - Smaller footprint
    - Reduced CoO
  • E-Mail : [semi@globalzeus.com]
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  • Scrubber SC series

  • Scrubber SC series
  • This system will drastically increase your yield
    - High throughput
    - Smaller footprint
    - Washing method
    - Brush/SN spray
  • E-Mail : [semi@globalzeus.com]
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  • Bevel Clean LIBRA series

  • Bevel Clean LIBRA series
  • This system will drastically increase your yeild. Process of safer bevel
  • E-Mail : [semi@globalzeus.com]
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  • Dryer MMDS

  • Dryer MMDS
  • IPA Vapor condensation dryer
  • E-Mail : [semi@globalzeus.com]
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  • VRC series

  • VRC series
  • Vapor-Phase decomposition residue collection
  • E-Mail : [semi@globalzeus.com]
  • Download :                  
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