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  • Wet Etching & Cleaning Solutions
  • ION(12 chamber) - Single Spin Solution

  • ION(12 chamber) - Single Spin Solution
  • - 12 chambers system
    - Foot print : 9.8m2 (12chamber)
    - High throughput
    - Individual process in each of the 6 chambers
    - Separate drain and exhaust for each chemical
    - Capable of flow control
    - High performance GUI
    (Efficient HMI configuration for system control)
  • E-Mail : [globalzeus@globalzeus.com]
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  • Apollon(1,2,4,8 chamber) - Single Spin Solution

  • Apollon(1,2,4,8 chamber) - Single Spin Solution
  • - 1, 2, 4, 8 chambers system
    - Foot print : 8.8m2 (8chamber)
    - High throughput
    - Separate drain and exhaust per chamber
    - Precise flow control
    - Customized and user friendly GUI
    - High purity pipe implemented
  • E-Mail : [globalzeus@globalzeus.com]
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  • Venus - High Temperature Single Spin Solution

  • Venus - High Temperature Single Spin Solution
  • - Minimum consumption of chemical (≤ 150 cc)
    - Capable of processing wafers at high temperatures (≤ 240ºC)
    - Ash-less stripping
    - Reduced chemical fumes by flip-over processing
    - Wafer back-side heating
    - Minimum process time for stripping (≤ 30 seconds)
  • E-Mail : [globalzeus@globalzeus.com]
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  • BW Series- Batch Solution

  • BW Series- Batch Solution
  • - Increased throughput up to 1.5x possible
    - Fume-free (individual auto-exhaust)
    - Simplified piping for easier maintenance
    - Various bath types
    - Minimized wafer contact
    - Reduced bubble generation
    - Improved reverse flow system
    - Improved concentration stability
    - 1 chemical + 1 DIW bath
    - Smaller footprint
    - Reduced CoO
  • E-Mail : [globalzeus@globalzeus.com]
  • Download :                  
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